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Embossing tools for high-resolution manufacturing
Exploiting its established expertise in Photo Electro Forming (PEF), Tecan has developed techniques to produce versatile cost-efficient embossing tools from which manufacturers can produce high-resolution prototype and mass-production parts in a range of materials.
Exploiting its established expertise in Photo Electro Forming (PEF), Tecan has developed techniques to produce versatile cost-efficient embossing tools from which manufacturers can produce high-resolution prototype and mass-production parts in a range of materials.
Typical applications for embossing tools include refractive and defractive micro-lens arrays, optical components, microfluidic structures for medical and laboratory applications, and high-definition electronic / opto-electronic circuits.
The company can replicate originals produced in photoresist, etched silicon, glass and diamond-turned metal, typically to produce an exact mirror-image replica in nickel. For example, if the original is male or female, defined by the peaks and troughs of its profile, the nickel replica will be the opposite gender.
The process allows the nickel duplicate to be simply separated from the master and used for processing, as it is, or as a parent part from which mirror-image ‘offspring’ can be produced, these will have exactly the same form and gender as the original. This allows expensive originals to be kept as perfect masters, from which any number of replicas, in any gender, can be produced at any time and at comparatively low cost – facilitating any level of production volumes of micro-featured parts.
Customised ‘master’ embossing tools can also be produced from original engineering drawings using PEF – the master tool being ‘grown’into a photolithographically defined resist mould to create the original features required.
High aspect ratios are also possible - depending on the packing density of the part’s surface features - with ratios of up to 12:1 achievable.
The company can tailor its process to suit individual requirements utilising a broad range of photoresist chemistries. Tools can be produced up to 300mm x 300mm, with apertures sizes down to 2 micron, and alignment accuracy of less than 1 micron.
Typical applications for embossing tools include refractive and defractive micro-lens arrays, optical components, microfluidic structures for medical and laboratory applications, and high-definition electronic / opto-electronic circuits.
The company can replicate originals produced in photoresist, etched silicon, glass and diamond-turned metal, typically to produce an exact mirror-image replica in nickel. For example, if the original is male or female, defined by the peaks and troughs of its profile, the nickel replica will be the opposite gender.
The process allows the nickel duplicate to be simply separated from the master and used for processing, as it is, or as a parent part from which mirror-image ‘offspring’ can be produced, these will have exactly the same form and gender as the original. This allows expensive originals to be kept as perfect masters, from which any number of replicas, in any gender, can be produced at any time and at comparatively low cost – facilitating any level of production volumes of micro-featured parts.
Customised ‘master’ embossing tools can also be produced from original engineering drawings using PEF – the master tool being ‘grown’into a photolithographically defined resist mould to create the original features required.
High aspect ratios are also possible - depending on the packing density of the part’s surface features - with ratios of up to 12:1 achievable.
The company can tailor its process to suit individual requirements utilising a broad range of photoresist chemistries. Tools can be produced up to 300mm x 300mm, with apertures sizes down to 2 micron, and alignment accuracy of less than 1 micron.
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