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Electroformed deposition masks offer advantages for metal sputtering and displays

Electroformed deposition masks offer advantages for metal sputtering and displays
High-performance electroformed deposition masks, for use across a wide range of selective vacuum chamber processes, have been developed and enhanced by Tecan.

High-performance electroformed deposition masks, for use across a wide range of selective vacuum chamber processes, have been developed and enhanced by Tecan.

Typically used to deposit inks onto substrates during the manufacture of a range of flat panel display technologies, the high-accuracy masks offer a number of advantages over alternative techniques such as inkjet printing or screen printing with emulsion stencils.

Tecan’s electroforming process - undertaken within its class 1000 cleanroom - produces tightly-toleranced display masks with burr-free aperture edges and controllable draft angles to ensure optimum print definition. Display technologies able to take advantage of the masks include liquid crystal displays, organic and inorganic light-emitting diode displays, plasma panel displays, vacuum fluorescent displays and field emission displays.

Single and multi-level masks can be produced, with ‘stepped’ recesses, limiting the need for spacer sheets in multiple-sheet sets, if required. Single masks, multi-mask sets, stepped masks and frame systems are all available to meet the individual needs of the application.

Masks can be plated in metals such as gold or rhodium, which are resistant to the acids used in post-deposition cleaning. This ensures any material deposited on the mask can be cleaned using the usual process - but without damage to the mask itself - significantly extending mask life and ensuring long-term cost-efficiency.

The plating metal is chosen to suit the needs of the individual application, so for example - when evaporating non-gold contacts, a gold-plated mask can be used - it will become coated during the evaporation process - but during cleaning will be completely unaffected by mild-acid flash etch.

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